抄録
We perform HF treatment to a-Si:H nanoball films fabricated by the double-tubed coaxial-line-type microwave plasma chemical vapor deposition (MPCVD) system. By HF treatment, Photoluminescence wavelength shifted from 760 nm to 590 nm. We have determined the diameter of Si nanocrystals by X-ray diffraction (XRD) and transmission electron microscopy (TEM). It is found that the diameter of Si nanocrystals decreases from 5 nm to 3.7 nm, by HF treatment.
本文言語 | English |
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ページ(範囲) | 7542-7543 |
ページ数 | 2 |
ジャーナル | Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers |
巻 | 43 |
号 | 11 A |
DOI | |
出版ステータス | Published - 2004 11月 |
ASJC Scopus subject areas
- 物理学および天文学(その他)