抜粋
We perform HF treatment to a-Si:H nanoball films fabricated by the double-tubed coaxial-line-type microwave plasma chemical vapor deposition (MPCVD) system. By HF treatment, Photoluminescence wavelength shifted from 760 nm to 590 nm. We have determined the diameter of Si nanocrystals by X-ray diffraction (XRD) and transmission electron microscopy (TEM). It is found that the diameter of Si nanocrystals decreases from 5 nm to 3.7 nm, by HF treatment.
| 元の言語 | English |
|---|---|
| ページ（範囲） | 7542-7543 |
| ページ数 | 2 |
| ジャーナル | Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers |
| 巻 | 43 |
| 発行部数 | 11 A |
| DOI | |
| 出版物ステータス | Published - 2004 11 |
ASJC Scopus subject areas
- Physics and Astronomy (miscellaneous)
フィンガープリント Effect of HF treatment on photoluminescence characteristics of a-Si: H nanoball films' の研究トピックを掘り下げます。これらはともに一意のフィンガープリントを構成します。
これを引用
Motoyama, Y., Suzuki, F., & Kato, I. (2004). Effect of HF treatment on photoluminescence characteristics of a-Si: H nanoball films. Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers, 43(11 A), 7542-7543. https://doi.org/10.1143/JJAP.43.7542