Effect of oxygen content on defect formation in pure-silica core fibers

Kaya Nagasawa, Yutaka Hoshi*, Yoshimichi Ohki

*この研究の対応する著者

研究成果査読

37 被引用数 (Scopus)

抄録

There is slight lack of stoichiometry in pure silica glass, which varies according to the synthesis process. The lack of stoichiometry leads to defect formations: The 245 nm absorption band and drawing-induced E’ centers are formed in oxygen-deficient silica, but peroxy radicals and drawing-induced 2 eV band are formed in oxygen-rich silica. The 245 nm band seems to be caused by the Si-Si bonding.

本文言語English
ページ(範囲)L554-L557
ジャーナルJapanese journal of applied physics
26
5A
DOI
出版ステータスPublished - 1987 5

ASJC Scopus subject areas

  • 工学(全般)
  • 物理学および天文学(全般)

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