Effect of oxygen content on defect formation in pure-silica core fibers

Kaya Nagasawa, Yutaka Hoshi*, Yoshimichi Ohki

*この研究の対応する著者

研究成果: Article査読

37 被引用数 (Scopus)

抄録

There is slight lack of stoichiometry in pure silica glass, which varies according to the synthesis process. The lack of stoichiometry leads to defect formations: The 245 nm absorption band and drawing-induced E’ centers are formed in oxygen-deficient silica, but peroxy radicals and drawing-induced 2 eV band are formed in oxygen-rich silica. The 245 nm band seems to be caused by the Si-Si bonding.

本文言語English
ページ(範囲)L554-L557
ジャーナルJapanese journal of applied physics
26
5A
DOI
出版ステータスPublished - 1987 5月

ASJC Scopus subject areas

  • 工学(全般)
  • 物理学および天文学(全般)

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