TY - JOUR
T1 - Effect of phosphorus content of the magnetic and electric properties of electroless ni–p film after heat treatment
AU - Osaka, Tetsuya
AU - Usuda, Masahiko
AU - Koiwa, Ichiro
AU - Sawai, Hideo
PY - 1988/10
Y1 - 1988/10
N2 - The magnetic and electric properties of electroless Ni–P films after heat treatment are investigated as a function of the P content in the deposit. The residual Ni, which means the surplus Ni (crystallized Ni) after Ni3P formation, is confirmed to determine the film properties of resistivity and saturation magnetization. Moreover, they depend only on the P content and are independent of the preparation conditions. The saturation magnetization, Ms, and the reciprocal of resistivity, ρ-1, are proportional to the amount of the residual Ni after sufficient heat treatment. An equation, showing the correlation between the P content and the resistivity or magnetization of the deposit after sufficient heat treatment, is proposed on the basis of the characters of ferromagnetic and metallic conductivity of the residual Ni matrix.
AB - The magnetic and electric properties of electroless Ni–P films after heat treatment are investigated as a function of the P content in the deposit. The residual Ni, which means the surplus Ni (crystallized Ni) after Ni3P formation, is confirmed to determine the film properties of resistivity and saturation magnetization. Moreover, they depend only on the P content and are independent of the preparation conditions. The saturation magnetization, Ms, and the reciprocal of resistivity, ρ-1, are proportional to the amount of the residual Ni after sufficient heat treatment. An equation, showing the correlation between the P content and the resistivity or magnetization of the deposit after sufficient heat treatment, is proposed on the basis of the characters of ferromagnetic and metallic conductivity of the residual Ni matrix.
KW - After heat treatment
KW - Electric resistivity
KW - Electroless plating
KW - Magnetization
KW - Phosphorus content
UR - http://www.scopus.com/inward/record.url?scp=0024090767&partnerID=8YFLogxK
UR - http://www.scopus.com/inward/citedby.url?scp=0024090767&partnerID=8YFLogxK
U2 - 10.1143/JJAP.27.1885
DO - 10.1143/JJAP.27.1885
M3 - Article
AN - SCOPUS:0024090767
SN - 0021-4922
VL - 27
SP - 1885
EP - 1889
JO - Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes
JF - Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes
IS - 10 R
ER -