Effect of sputtering geometry on (112̄0) textured ZnO piezofilm

Yoshinori Miyamoto*, Takahiko Yanagitani, Mami Matsukawa, Yoshiaki Watanabe

*この研究の対応する著者

研究成果: Review article査読

5 被引用数 (Scopus)

抄録

The effects of sputtering geometry on (112̄0) textured ZnO piezofilm were analyzed. The ZnO film was fabricated using a conventional RF magnetron sputtering apparatus. The crystallite alignment in the substrate normal direction was estimated using the full width half maximum (FWHM) of the ω-scan rocking curve. The results show that crystallites alignment and film thickness are strongly affected by the substrate position, despite that the other sputtering conditions are identical.

本文言語English
ページ(範囲)53-55
ページ数3
ジャーナルAcoustical Science and Technology
27
1
DOI
出版ステータスPublished - 2006
外部発表はい

ASJC Scopus subject areas

  • 音響学および超音波学

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