The effects of sputtering geometry on (112̄0) textured ZnO piezofilm were analyzed. The ZnO film was fabricated using a conventional RF magnetron sputtering apparatus. The crystallite alignment in the substrate normal direction was estimated using the full width half maximum (FWHM) of the ω-scan rocking curve. The results show that crystallites alignment and film thickness are strongly affected by the substrate position, despite that the other sputtering conditions are identical.
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