Effect of Tl-codeposition on Au electrodeposition from non-cyanide bath

M. Saito, K. Inoue, K. Shiokawa, T. Homma

研究成果: Conference contribution

6 引用 (Scopus)

抜粋

Effect of Tl on the electrodeposition behavior of Au was investigated by electrochemical analysis, total-reflection X-ray fluorescene analysis, XRD, glow discharge optical emission spectrometer (GD-OES) and hardness measurement. The deposition rate increased with an increase in the amount of Tl addition to the bath. Tl was co-deposited at the interface between the seed layer and the Au films, as well as in the films. In asdeposited condition, the Tl contained films exhibited higher hardness compared with the Tl-free films, while both of them showed almost the same hardness after annealing. It was suggested that the hardness is correlated with the crystal orientation of the grains.

元の言語English
ホスト出版物のタイトルFundamentals of Electrochemical Growth
ホスト出版物のサブタイトルFrom UPD to Microstructures - Symposium in Memory of Prof. Evgeni Budevski
ページ87-96
ページ数10
エディション34
DOI
出版物ステータスPublished - 2010 12 1
イベントFundamentals of Electrochemical Growth: From UPD to Microstructures - Symposium in Memory of Prof. Evgeni Budevski - 216th ECS Meeting - Vienna, Austria
継続期間: 2009 10 42009 10 9

出版物シリーズ

名前ECS Transactions
番号34
25
ISSN(印刷物)1938-5862
ISSN(電子版)1938-6737

Conference

ConferenceFundamentals of Electrochemical Growth: From UPD to Microstructures - Symposium in Memory of Prof. Evgeni Budevski - 216th ECS Meeting
Austria
Vienna
期間09/10/409/10/9

ASJC Scopus subject areas

  • Engineering(all)

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  • これを引用

    Saito, M., Inoue, K., Shiokawa, K., & Homma, T. (2010). Effect of Tl-codeposition on Au electrodeposition from non-cyanide bath. : Fundamentals of Electrochemical Growth: From UPD to Microstructures - Symposium in Memory of Prof. Evgeni Budevski (34 版, pp. 87-96). (ECS Transactions; 巻数 25, 番号 34). https://doi.org/10.1149/1.3335495