Electrical properties of heavily Si-doped GaAsN after annealing

Takashi Tsukasaki*, Naoki Mochida, Miki Fujita, Toshiki Makimoto

*この研究の対応する著者

研究成果: Article査読

抄録

In this study, electron traps in dilute GaAsN are investigated using the temperature dependence of electron concentration (n) and mobility (μe) for annealed heavily Si-doped GaAsN. The temperature dependence of n and μe depends on the annealing temperature, indicating that electrons are excited to the conduction band only from deep electron traps for heavily Si-doped GaAsN annealed at 580 °C. However, they are excited to the conduction band from both the deep electron traps and the shallow Si donor level for heavily Si-doped GaAsN annealed at 550 °C. The depth of the deep electron traps from the bottom of the conduction band for heavily Si-doped GaAsN annealed at 550 °C is almost equal to heavily Si-doped GaAsN annealed at 580 °C. The results demonstrate that these deep electron traps are inherent in dilute GaAsN because similar deep electron traps are also observed for the as-grown Si-doped GaAsN.

本文言語English
論文番号413482
ジャーナルPhysica B: Condensed Matter
625
DOI
出版ステータスPublished - 2022 1月 15

ASJC Scopus subject areas

  • 電子材料、光学材料、および磁性材料
  • 凝縮系物理学
  • 電子工学および電気工学

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