Electrical resistivity and microstructures of sputtered CuxMo6S8 films

B. R. Zhao; R. Ohtaki; H. L. Luo; L. D. Flesner

doi:10.1016/0040-6090(83)90236-5

Electrical resistivity and microstructures of sputtered Cu_xMo₆S₈ films

B. R. Zhao, R. Ohtaki, H. L. Luo, L. D. Flesner

研究成果: Article › 査読

11 被引用数 (Scopus)

抄録

The resistivity of superconducting Cu_xMo₆S₈ films prepared by sputtering was measured between 10 and 300 K. Using a scanning electron microscope, the microstructures of the films with different preparation conditions were examined. The broadly varying values of the measured resistivities were explained on the basis of the particular microstructures of the films.

本文言語	English
ページ（範囲）	185-192
ページ数	8
ジャーナル	Thin Solid Films
巻	110
号	3
DOI	https://doi.org/10.1016/0040-6090(83)90236-5
出版ステータス	Published - 1983 12 16
外部発表	はい

ASJC Scopus subject areas

Electronic, Optical and Magnetic Materials
Surfaces and Interfaces
Surfaces, Coatings and Films
Metals and Alloys
Materials Chemistry

文献へのアクセス

10.1016/0040-6090(83)90236-5

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引用スタイル

@article{af2b3c6776a44573ad9d5eade438aa6f,

title = "Electrical resistivity and microstructures of sputtered CuxMo6S8 films",

abstract = "The resistivity of superconducting CuxMo6S8 films prepared by sputtering was measured between 10 and 300 K. Using a scanning electron microscope, the microstructures of the films with different preparation conditions were examined. The broadly varying values of the measured resistivities were explained on the basis of the particular microstructures of the films.",

author = "Zhao, {B. R.} and R. Ohtaki and Luo, {H. L.} and Flesner, {L. D.}",

note = "Funding Information: This study was supported by the National Science Foundation Research Grant DMR 81-08421.",

year = "1983",

month = dec,

day = "16",

doi = "10.1016/0040-6090(83)90236-5",

language = "English",

volume = "110",

pages = "185--192",

journal = "Thin Solid Films",

issn = "0040-6090",

publisher = "Elsevier",

number = "3",

}

TY - JOUR

T1 - Electrical resistivity and microstructures of sputtered CuxMo6S8 films

AU - Zhao, B. R.

AU - Ohtaki, R.

AU - Luo, H. L.

AU - Flesner, L. D.

N1 - Funding Information: This study was supported by the National Science Foundation Research Grant DMR 81-08421.

PY - 1983/12/16

Y1 - 1983/12/16

N2 - The resistivity of superconducting CuxMo6S8 films prepared by sputtering was measured between 10 and 300 K. Using a scanning electron microscope, the microstructures of the films with different preparation conditions were examined. The broadly varying values of the measured resistivities were explained on the basis of the particular microstructures of the films.

AB - The resistivity of superconducting CuxMo6S8 films prepared by sputtering was measured between 10 and 300 K. Using a scanning electron microscope, the microstructures of the films with different preparation conditions were examined. The broadly varying values of the measured resistivities were explained on the basis of the particular microstructures of the films.

UR - http://www.scopus.com/inward/record.url?scp=0020892771&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=0020892771&partnerID=8YFLogxK

U2 - 10.1016/0040-6090(83)90236-5

DO - 10.1016/0040-6090(83)90236-5

M3 - Article

AN - SCOPUS:0020892771

VL - 110

SP - 185

EP - 192

JO - Thin Solid Films

JF - Thin Solid Films

SN - 0040-6090

IS - 3

ER -