Electrical resistivity and microstructures of sputtered CuxMo6S8 films

B. R. Zhao, R. Ohtaki, H. L. Luo, L. D. Flesner

研究成果: Article査読

11 被引用数 (Scopus)

抄録

The resistivity of superconducting CuxMo6S8 films prepared by sputtering was measured between 10 and 300 K. Using a scanning electron microscope, the microstructures of the films with different preparation conditions were examined. The broadly varying values of the measured resistivities were explained on the basis of the particular microstructures of the films.

本文言語English
ページ(範囲)185-192
ページ数8
ジャーナルThin Solid Films
110
3
DOI
出版ステータスPublished - 1983 12 16
外部発表はい

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Metals and Alloys
  • Materials Chemistry

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