抄録
The resistivity of superconducting CuxMo6S8 films prepared by sputtering was measured between 10 and 300 K. Using a scanning electron microscope, the microstructures of the films with different preparation conditions were examined. The broadly varying values of the measured resistivities were explained on the basis of the particular microstructures of the films.
本文言語 | English |
---|---|
ページ(範囲) | 185-192 |
ページ数 | 8 |
ジャーナル | Thin Solid Films |
巻 | 110 |
号 | 3 |
DOI | |
出版ステータス | Published - 1983 12月 16 |
外部発表 | はい |
ASJC Scopus subject areas
- 電子材料、光学材料、および磁性材料
- 表面および界面
- 表面、皮膜および薄膜
- 金属および合金
- 材料化学