Electrochemical fabrication of CoPt nanodot arrays on glass disks by UV nanoimprint lithography

T. Ouchi, Y. Arikawa, J. Mizuno, S. Shoji, T. Homma

研究成果: Conference contribution

3 引用 (Scopus)

抜粋

A fabrication process for CoPt nanodot arrays using an electrochemical approach was proposed. The nano-patterncd substrates were formed using electron beam lithography (EBL) and UV nanoimprint lithography (UV-NIL). CoPt was electrodeposited into nano-patterned Si substrates. CoPt nanodot arrays with 35 rail diameter and 50 nm pitch using EBL and 50 nm diameter and 100 nm pitch using UV-NIL were successfully fabricated. In addition, we attempted to apply 1 inch glass disk substrates with CoZrNb underlayer as soft magnetic underlayer (SUL). We focused on the surface condition of the underlayers to deposit CoPt with uniformity and high magnetic properties. As a result, CoPt nanodot arrays were successfully fabricated on a 1 inch glass disk substrate with SUL using thin Cu intermediate layers. From these results, it has been found that the combination of the UV-NIL and electrochemical processes is a candidate for the fabrication of ultra high-density magnetic recording media.

元の言語English
ホスト出版物のタイトルECS Transactions - Magnetic Materials, Processes and Devices 10 - 214th ECS Meeting
ページ57-64
ページ数8
エディション45
DOI
出版物ステータスPublished - 2009 11 23
イベントMagnetic Materials, Processes and Devices 10 - 214th ECS Meeting - Honolulu, HI, United States
継続期間: 2008 10 122008 10 17

出版物シリーズ

名前ECS Transactions
番号45
16
ISSN(印刷物)1938-5862
ISSN(電子版)1938-6737

Conference

ConferenceMagnetic Materials, Processes and Devices 10 - 214th ECS Meeting
United States
Honolulu, HI
期間08/10/1208/10/17

ASJC Scopus subject areas

  • Engineering(all)

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  • これを引用

    Ouchi, T., Arikawa, Y., Mizuno, J., Shoji, S., & Homma, T. (2009). Electrochemical fabrication of CoPt nanodot arrays on glass disks by UV nanoimprint lithography. : ECS Transactions - Magnetic Materials, Processes and Devices 10 - 214th ECS Meeting (45 版, pp. 57-64). (ECS Transactions; 巻数 16, 番号 45). https://doi.org/10.1149/1.3140010