Electrochemical properties of δ- and γ-MnO2 thin films deposited by a chemical bath technique

Terukazu Kondo, Yuta Matsushima, Keigo Matsuda, Hidero Unuma*

*この研究の対応する著者

研究成果: Article査読

4 被引用数 (Scopus)

抄録

In this study, γ- and δ-MnO2 thin films were deposited onto F-doped tin oxide glass substrates via a chemical bath deposition technique in which manganese (II) ions were oxidized by bromate ion in a homogeneous solution. The addition of cetyltrimethylammonium chlorate to the starting solutions resulted in the deposition of the δ-phase. The thin films showed rectangular cyclic voltammograms even at higher scan rates. The δ-phase films showed better specific capacitance than the γ-phase films. A 200-nm-thick δ-MnO2 film showed an excellent specific capacitance of 750 F/g at a scan rate of 10 mV/s.

本文言語English
ページ(範囲)8001-8005
ページ数5
ジャーナルJournal of Materials Science: Materials in Electronics
27
8
DOI
出版ステータスPublished - 2016 8 1
外部発表はい

ASJC Scopus subject areas

  • 電子材料、光学材料、および磁性材料
  • 原子分子物理学および光学
  • 凝縮系物理学
  • 電子工学および電気工学

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