Electrochemical quartz crystal microbalance, X-ray photoelectron spectroscopy, and Raman spectroscopy analysis of SiCl4 reduction in ionic liquids

Yasuhiro Tsuyuki, Tram Anh Pham Huynh, Jason Komadina, Yasuhiro Fukunaka, Takayuki Homma

    研究成果: Article

    4 引用 (Scopus)

    抄録

    The reaction mechanism of Si electrodeposition in the ionic liquid trimethyl-n-hexylammonium bis(trifluoromethylsulfonyl) imide (TMHATFSI) with SiCl4 was investigated using an electrochemical quartz crystal microbalance (EQCM) and X-ray photoelectron spectroscopy (XPS). The deposited films were further characterized by Raman spectroscopy. The EQCM method measured the frequency change in situ during electrodeposition, whereas XPS provided the Si mass concentration in the electrodeposited films. By combining these results, the mass change due to SiCl4 reduction was estimated. Then, the current efficiency for Si electrodeposition at various potentials was evaluated. The calculated current efficiency was almost 100% when it was assumed that SiCl4 reduction progressed by four-electron electroreduction. The XPS and Raman results showed that the deposited films were composed primarily of amorphous Si with Si-Si bonds. Crystalline Si thin films were obtained after annealing in an Ar gas stream.

    元の言語English
    ページ(範囲)49-55
    ページ数7
    ジャーナルElectrochimica Acta
    183
    DOI
    出版物ステータスPublished - 2015 11 20

    Fingerprint

    Ionic Liquids
    Quartz crystal microbalances
    Ionic liquids
    Electrodeposition
    Raman spectroscopy
    X ray photoelectron spectroscopy
    Imides
    Gases
    Annealing
    Crystalline materials
    Thin films
    Electrons

    ASJC Scopus subject areas

    • Electrochemistry
    • Chemical Engineering(all)

    これを引用

    Electrochemical quartz crystal microbalance, X-ray photoelectron spectroscopy, and Raman spectroscopy analysis of SiCl4 reduction in ionic liquids. / Tsuyuki, Yasuhiro; Pham Huynh, Tram Anh; Komadina, Jason; Fukunaka, Yasuhiro; Homma, Takayuki.

    :: Electrochimica Acta, 巻 183, 20.11.2015, p. 49-55.

    研究成果: Article

    @article{41f73f7f0abb41cdb1b6213d77eb4273,
    title = "Electrochemical quartz crystal microbalance, X-ray photoelectron spectroscopy, and Raman spectroscopy analysis of SiCl4 reduction in ionic liquids",
    abstract = "The reaction mechanism of Si electrodeposition in the ionic liquid trimethyl-n-hexylammonium bis(trifluoromethylsulfonyl) imide (TMHATFSI) with SiCl4 was investigated using an electrochemical quartz crystal microbalance (EQCM) and X-ray photoelectron spectroscopy (XPS). The deposited films were further characterized by Raman spectroscopy. The EQCM method measured the frequency change in situ during electrodeposition, whereas XPS provided the Si mass concentration in the electrodeposited films. By combining these results, the mass change due to SiCl4 reduction was estimated. Then, the current efficiency for Si electrodeposition at various potentials was evaluated. The calculated current efficiency was almost 100{\%} when it was assumed that SiCl4 reduction progressed by four-electron electroreduction. The XPS and Raman results showed that the deposited films were composed primarily of amorphous Si with Si-Si bonds. Crystalline Si thin films were obtained after annealing in an Ar gas stream.",
    keywords = "annealing, EQCM, ionic liquids, Si electrodeposition, XPS",
    author = "Yasuhiro Tsuyuki and {Pham Huynh}, {Tram Anh} and Jason Komadina and Yasuhiro Fukunaka and Takayuki Homma",
    year = "2015",
    month = "11",
    day = "20",
    doi = "10.1016/j.electacta.2015.04.167",
    language = "English",
    volume = "183",
    pages = "49--55",
    journal = "Electrochimica Acta",
    issn = "0013-4686",
    publisher = "Elsevier Limited",

    }

    TY - JOUR

    T1 - Electrochemical quartz crystal microbalance, X-ray photoelectron spectroscopy, and Raman spectroscopy analysis of SiCl4 reduction in ionic liquids

    AU - Tsuyuki, Yasuhiro

    AU - Pham Huynh, Tram Anh

    AU - Komadina, Jason

    AU - Fukunaka, Yasuhiro

    AU - Homma, Takayuki

    PY - 2015/11/20

    Y1 - 2015/11/20

    N2 - The reaction mechanism of Si electrodeposition in the ionic liquid trimethyl-n-hexylammonium bis(trifluoromethylsulfonyl) imide (TMHATFSI) with SiCl4 was investigated using an electrochemical quartz crystal microbalance (EQCM) and X-ray photoelectron spectroscopy (XPS). The deposited films were further characterized by Raman spectroscopy. The EQCM method measured the frequency change in situ during electrodeposition, whereas XPS provided the Si mass concentration in the electrodeposited films. By combining these results, the mass change due to SiCl4 reduction was estimated. Then, the current efficiency for Si electrodeposition at various potentials was evaluated. The calculated current efficiency was almost 100% when it was assumed that SiCl4 reduction progressed by four-electron electroreduction. The XPS and Raman results showed that the deposited films were composed primarily of amorphous Si with Si-Si bonds. Crystalline Si thin films were obtained after annealing in an Ar gas stream.

    AB - The reaction mechanism of Si electrodeposition in the ionic liquid trimethyl-n-hexylammonium bis(trifluoromethylsulfonyl) imide (TMHATFSI) with SiCl4 was investigated using an electrochemical quartz crystal microbalance (EQCM) and X-ray photoelectron spectroscopy (XPS). The deposited films were further characterized by Raman spectroscopy. The EQCM method measured the frequency change in situ during electrodeposition, whereas XPS provided the Si mass concentration in the electrodeposited films. By combining these results, the mass change due to SiCl4 reduction was estimated. Then, the current efficiency for Si electrodeposition at various potentials was evaluated. The calculated current efficiency was almost 100% when it was assumed that SiCl4 reduction progressed by four-electron electroreduction. The XPS and Raman results showed that the deposited films were composed primarily of amorphous Si with Si-Si bonds. Crystalline Si thin films were obtained after annealing in an Ar gas stream.

    KW - annealing

    KW - EQCM

    KW - ionic liquids

    KW - Si electrodeposition

    KW - XPS

    UR - http://www.scopus.com/inward/record.url?scp=84956923293&partnerID=8YFLogxK

    UR - http://www.scopus.com/inward/citedby.url?scp=84956923293&partnerID=8YFLogxK

    U2 - 10.1016/j.electacta.2015.04.167

    DO - 10.1016/j.electacta.2015.04.167

    M3 - Article

    AN - SCOPUS:84956923293

    VL - 183

    SP - 49

    EP - 55

    JO - Electrochimica Acta

    JF - Electrochimica Acta

    SN - 0013-4686

    ER -