TY - JOUR
T1 - Electroless-deposited soft magnetic underlayer on silicon disk substrate for double-layered perpendicular magnetic recording media
AU - Osaka, T.
AU - Asahi, T.
AU - Yokoshima, T.
AU - Kawaji, J.
N1 - Funding Information:
This work was carried out at the “Center for Practical Nano-Chemistry” in the 21C-COE Program, MEXT, Japan. The work was financially supported by grants-in-aid of the Special Coordination Funds for Promoting Science and Technology, and the Center of Excellence Research from MEXT. The authors thank Professor K. Hono, National Institute for Materials Science, for useful TEM data. The authors also thank Mr. T. Tsumori, Shin-Etsu Chemical Co. for his fruitful discussion and Mr. M. Ohmori, Showa Denko K.K, and H. Sakai, Showa Denko HD. K.K, for their cooperation. J.K. acknowledges the Research Fellowship of the Japan Society for the Promotion of Science for Young Scientists.
PY - 2005/2
Y1 - 2005/2
N2 - A novel fabrication process of a soft magnetic underlayer (SUL) for a double-layered perpendicular magnetic recording medium was presented. The CoNiFeB SUL was deposited on a silicon disk substrate using an electroless deposition. The Ni seed layer for the electroless deposition was prepared by an electrochemical process. The surface of the deposited SUL was subjected to a chemical mechanical polishing to be flattened, and Ra value of the SUL was less than 0.4 nm. A magnetic domain structure greatly depended on the electroless deposition condition. Particularly, the control of an agitation speed during electroless deposition is much effective for the suppression of distinct domain walls appearing in CoNiFeB underlayers.
AB - A novel fabrication process of a soft magnetic underlayer (SUL) for a double-layered perpendicular magnetic recording medium was presented. The CoNiFeB SUL was deposited on a silicon disk substrate using an electroless deposition. The Ni seed layer for the electroless deposition was prepared by an electrochemical process. The surface of the deposited SUL was subjected to a chemical mechanical polishing to be flattened, and Ra value of the SUL was less than 0.4 nm. A magnetic domain structure greatly depended on the electroless deposition condition. Particularly, the control of an agitation speed during electroless deposition is much effective for the suppression of distinct domain walls appearing in CoNiFeB underlayers.
KW - Electroless deposition
KW - Perpendicular magnetic recording medium
KW - Silicon disk
KW - Soft magnetic underlayer
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U2 - 10.1016/j.jmmm.2004.10.086
DO - 10.1016/j.jmmm.2004.10.086
M3 - Article
AN - SCOPUS:12344334437
SN - 0304-8853
VL - 287
SP - 292
EP - 297
JO - Journal of Magnetism and Magnetic Materials
JF - Journal of Magnetism and Magnetic Materials
IS - SPEC. ISS.
ER -