抄録
Oxidation of silicon by collimated hyperthermal ozone beam produced by pulsed-laser ablation of solid ozone, was reported. This led to decrease in the process temperature and increase in the controllability of oxidation. Laser shots, to which the number of supplied ozone molecules were propotional, were used to control the oxidation rate. Higher oxidation efficieny was reported in comparison with that by using continuous ozone spray with thermal energy.
| 本文言語 | English |
|---|---|
| ページ（範囲） | 382-384 |
| ページ数 | 3 |
| ジャーナル | Applied Physics Letters |
| 巻 | 79 |
| 号 | 3 |
| DOI | |
| 出版ステータス | Published - 2001 7月 16 |
| 外部発表 | はい |
ASJC Scopus subject areas
- 物理学および天文学（その他）