Enhanced oxidation of silicon using a collimated hyperthermal ozone beam

T. Nishiguchi*, Y. Morikawa, M. Miyamoto, H. Nonaka, S. Ichimura

*この研究の対応する著者

研究成果: Article査読

8 被引用数 (Scopus)

抄録

Oxidation of silicon by collimated hyperthermal ozone beam produced by pulsed-laser ablation of solid ozone, was reported. This led to decrease in the process temperature and increase in the controllability of oxidation. Laser shots, to which the number of supplied ozone molecules were propotional, were used to control the oxidation rate. Higher oxidation efficieny was reported in comparison with that by using continuous ozone spray with thermal energy.

本文言語English
ページ(範囲)382-384
ページ数3
ジャーナルApplied Physics Letters
79
3
DOI
出版ステータスPublished - 2001 7月 16
外部発表はい

ASJC Scopus subject areas

  • 物理学および天文学(その他)

フィンガープリント

「Enhanced oxidation of silicon using a collimated hyperthermal ozone beam」の研究トピックを掘り下げます。これらがまとまってユニークなフィンガープリントを構成します。

引用スタイル