Evaluation of sensitivity for positive tone non-chemically and chemically amplified resists using ionized radiation: EUV, X-ray, electron and ion induced reactions

Akihiro Oshima, Tomoko Gowa Oyama, Masakazu Washio, Seiichi Tagawa

研究成果: Conference contribution

3 被引用数 (Scopus)

フィンガープリント

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Mathematics

Physics & Astronomy

Chemical Compounds

Engineering & Materials Science