Evaluation of the crystal structure, film properties, and Bs of electroplated CoNiFe films

M. Saito*, N. Ishiwata, K. Ohashi

*この研究の対応する著者

研究成果: Article査読

16 被引用数 (Scopus)

抄録

The factors which affect the saturation magnetic flux density (Bs) of electroplated CoNiFe films were investigated and the results are reported. The Fe composition, the ratio of body-centered cubic (110) to face-centered cubic (111) peak intensity (Rb), and the density were found to affect the Bs of the films. The Bs increased when the Rb, Fe composition, and the density were increased; we found that a larger grain size and fewer impurities produced a higher density film. It was determined that the suppression of the impurities and the increased grain size led to the high film density and high Bs.

本文言語English
ページ(範囲)C642-C647
ジャーナルJournal of the Electrochemical Society
149
12
DOI
出版ステータスPublished - 2002 12 1
外部発表はい

ASJC Scopus subject areas

  • 電子材料、光学材料、および磁性材料
  • 再生可能エネルギー、持続可能性、環境
  • 表面、皮膜および薄膜
  • 電気化学
  • 材料化学

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