Extendibility of proximity x-ray lithography to 25 nm and below

Eijiro Toyota, Masakazu Washio

研究成果: Article

13 引用 (Scopus)

抜粋

A procedure to extend the limit of proximity x-ray lithography (PXL) by changing the exposure methods is proposed. In particular, it is shown that PXL can be used at 25 nm and most probably 18 nm design rule by changing the exposure methods corresponding to the gap limit by steppers. The same light source and facility layout can be used throughout the full generations of PXL.

元の言語English
ページ(範囲)2979-2983
ページ数5
ジャーナルJournal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
20
発行部数6
DOI
出版物ステータスPublished - 2002 11 1

ASJC Scopus subject areas

  • Condensed Matter Physics
  • Electrical and Electronic Engineering

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