Extreme high vacuum field emission microscope for study on the inherent fluctuation of field emission

B. Cho, T. Itagaki, T. Ishikawa, E. Rokuta, C. Oshima

研究成果: Article

1 引用 (Scopus)

抄録

An extreme high vacuum field emission microscope (XHV FEM) was constructed for the study of inherent fluctuations of field emission (FE) current. The damping and fluctuation behaviors of FE current from clean W(111) tips at 90 K were observed using the XHV FEM. Exposure to XHV of 7.5× 10-10 Pa continued to damp FE current for more than 2000 min. The fluctuation (∼0.01%) of FE current (1 nA) for the clean W(111) tips was comparable to the corresponding shot noise fluctuation (0.005%), demonstrating the suitability of the XHV FEM for the inherent fluctuation study of the FE process. After saturating the tip surface with hydrogen, the FE current showed fluctuations of <0.1%

元の言語English
ページ(範囲)1420-1423
ページ数4
ジャーナルJournal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
25
発行部数4
DOI
出版物ステータスPublished - 2007

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Field emission microscopes
high vacuum
Field emission
field emission
microscopes
Vacuum
Finite element method
Shot noise
shot noise
Damping
damping
Hydrogen

ASJC Scopus subject areas

  • Electrical and Electronic Engineering
  • Surfaces and Interfaces
  • Physics and Astronomy (miscellaneous)

これを引用

Extreme high vacuum field emission microscope for study on the inherent fluctuation of field emission. / Cho, B.; Itagaki, T.; Ishikawa, T.; Rokuta, E.; Oshima, C.

:: Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures, 巻 25, 番号 4, 2007, p. 1420-1423.

研究成果: Article

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