Extreme high vacuum field emission microscope for study on the inherent fluctuation of field emission

B. Cho, T. Itagaki, T. Ishikawa, E. Rokuta, C. Oshima

研究成果: Article査読

1 被引用数 (Scopus)

抄録

An extreme high vacuum field emission microscope (XHV FEM) was constructed for the study of inherent fluctuations of field emission (FE) current. The damping and fluctuation behaviors of FE current from clean W(111) tips at 90 K were observed using the XHV FEM. Exposure to XHV of 7.5× 10-10 Pa continued to damp FE current for more than 2000 min. The fluctuation (∼0.01%) of FE current (1 nA) for the clean W(111) tips was comparable to the corresponding shot noise fluctuation (0.005%), demonstrating the suitability of the XHV FEM for the inherent fluctuation study of the FE process. After saturating the tip surface with hydrogen, the FE current showed fluctuations of <0.1%

本文言語English
ページ(範囲)1420-1423
ページ数4
ジャーナルJournal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
25
4
DOI
出版ステータスPublished - 2007

ASJC Scopus subject areas

  • 電子工学および電気工学
  • 表面および界面
  • 物理学および天文学(その他)

フィンガープリント

「Extreme high vacuum field emission microscope for study on the inherent fluctuation of field emission」の研究トピックを掘り下げます。これらがまとまってユニークなフィンガープリントを構成します。

引用スタイル