Fabrication of 3-D micromesh ni structures using electroplating

Hironobu Sato, Toshiharu Otsuka, Shuichi Shoji

    研究成果: Conference contribution

    抜粋

    This paper presents the fabrication method of 3-D Ni micromesh structures. Inverse-micromesh photoresist structures, fabricated by multiple inclined backside exposure, were used as molds for Ni electroplating. Ni micromeshes of about 3μm in diameter were realized by this method. This structure is useful for increasing the surface area of micro metal electrodes.

    元の言語English
    ホスト出版物のタイトルProceedings - Electrochemical Society
    編集者J.L. Davidson, P.J. Hesketh, D. Misra, S. Shoji
    ページ26-30
    ページ数5
    9
    出版物ステータスPublished - 2004
    イベントMicrofabricated Systems and MEMS VII - Proceedings of the International Symposium - Honolulu, HI
    継続期間: 2004 10 32004 10 8

    Other

    OtherMicrofabricated Systems and MEMS VII - Proceedings of the International Symposium
    Honolulu, HI
    期間04/10/304/10/8

      フィンガープリント

    ASJC Scopus subject areas

    • Engineering(all)

    これを引用

    Sato, H., Otsuka, T., & Shoji, S. (2004). Fabrication of 3-D micromesh ni structures using electroplating. : J. L. Davidson, P. J. Hesketh, D. Misra, & S. Shoji (版), Proceedings - Electrochemical Society (巻 9, pp. 26-30)