Fabrication of 3-D micromesh ni structures using electroplating

Hironobu Sato, Toshiharu Otsuka, Shuichi Shoji

研究成果: Paper査読

抄録

This paper presents the fabrication method of 3-D Ni micromesh structures. Inverse-micromesh photoresist structures, fabricated by multiple inclined backside exposure, were used as molds for Ni electroplating. Ni micromeshes of about 3μm in diameter were realized by this method. This structure is useful for increasing the surface area of micro metal electrodes.

本文言語English
ページ26-30
ページ数5
出版ステータスPublished - 2004 12 1
イベントMicrofabricated Systems and MEMS VII - Proceedings of the International Symposium - Honolulu, HI, United States
継続期間: 2004 10 32004 10 8

Conference

ConferenceMicrofabricated Systems and MEMS VII - Proceedings of the International Symposium
CountryUnited States
CityHonolulu, HI
Period04/10/304/10/8

ASJC Scopus subject areas

  • Engineering(all)

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