Fabrication of 3D a-Si/SiO2 photonic crystals on 2D sub-micron-patterned InP substrates

Tetsuro Segawa*, Katsuyuki Utaka, Mitsuru Naganuma, Hisashi Sato, Shojiro Kawakami, Masayuki Izutsu, Masashi Nakao

*この研究の対応する著者

研究成果: Conference article査読

抄録

We have fabricated three-dimensional (3D) periodic structures consisting of stacked a-Si/SiO2 layers directly on two-dimensional (2D) sub-micron-patterned (100)-InP substrates by using autocloning technology. The initial 2D pattern has been reflected in the 3D periodic structures, whose height has been amplified. We have measured the transmission and reflection spectra of the 3D periodic structures, and have observed the photonic band gaps in the wavelength region of around 1400 to 2200 nm. We have also observed strong polarization dependency for the samples with the triangular lattice and week dependency for those of the square case.

本文言語English
ページ(範囲)561-564
ページ数4
ジャーナルConference Proceedings - International Conference on Indium Phosphide and Related Materials
出版ステータスPublished - 2002 1 1
イベント14th Indium Phosphide and Related Materials Conference - Stockholm, Sweden
継続期間: 2002 5 122002 5 16

ASJC Scopus subject areas

  • 電子材料、光学材料、および磁性材料
  • 電子工学および電気工学

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