Fabrication of a polymer high-aspect-ratio pillar array using UV imprinting

Hidetoshi Shinohara, Hiroshi Goto, Takashi Kasahara, Jun Mizuno

研究成果: Article

4 引用 (Scopus)

抄録

This paper presents UV imprinting methods for fabricating a high-aspect-ratio pillar array. A polydimethylsiloxane (PDMS) mold was selected as the UV imprinting mold. The pillar pattern was formed on a 50 × 50 mm2 area on a polyethylene terephthalate (PET) film without remarkable deformation. The aspect ratios of the pillar and space were about four and ten, respectively. The mold was placed into contact with a UV-curable resin under a reduced pressure, and the resin was cured by UV light irradiation after exposure to atmospheric pressure. The PDMS mold showed good mold releasability and high flexibility. By moderately pressing the mold before UV-curing, the thickness of the residual layer of the imprinted resin was reduced and the pattern was precisely imprinted. Both batch pressing and roll pressing are available.

元の言語English
ページ(範囲)157-167
ページ数11
ジャーナルMicromachines
4
発行部数2
DOI
出版物ステータスPublished - 2013

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Aspect ratio
Resins
Polydimethylsiloxane
Fabrication
Polymers
Ultraviolet radiation
Polyethylene terephthalates
Atmospheric pressure
Curing
Irradiation

ASJC Scopus subject areas

  • Electrical and Electronic Engineering
  • Control and Systems Engineering
  • Mechanical Engineering

これを引用

Fabrication of a polymer high-aspect-ratio pillar array using UV imprinting. / Shinohara, Hidetoshi; Goto, Hiroshi; Kasahara, Takashi; Mizuno, Jun.

:: Micromachines, 巻 4, 番号 2, 2013, p. 157-167.

研究成果: Article

Shinohara, Hidetoshi ; Goto, Hiroshi ; Kasahara, Takashi ; Mizuno, Jun. / Fabrication of a polymer high-aspect-ratio pillar array using UV imprinting. :: Micromachines. 2013 ; 巻 4, 番号 2. pp. 157-167.
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