抄録
We have fabricated a-Si:H thin films using a microwave discharge under a magnetic field of electron cyclotron resonance (ECR). The films fabricated in ECR plasma are predominantly Si-H bonded because of high-energy plasma particle bombardment. The films fabricated on glass substrates, however, peel off easily because of the difference in the coefficient of heat expansion between the film and the substrate. The films fabricated out of ECR plasma are not subjected to the bombardment and are mainly Si-H2 bonded. These films do not peel off even when deposited on glass substrate and are of high quality.
| 本文言語 | English |
|---|---|
| ページ（範囲） | 343-345 |
| ページ数 | 3 |
| ジャーナル | Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers |
| 巻 | 28 |
| 号 | 3 |
| 出版ステータス | Published - 1989 3月 |
ASJC Scopus subject areas
- 物理学および天文学（その他）