Fabrication of a-Si: H thin films using a microwave discharge under a magnetic field of electron cyclotron resonance

Kiyotaka Kato*, Isamu Kato

*この研究の対応する著者

研究成果: Article査読

3 被引用数 (Scopus)

抄録

We have fabricated a-Si:H thin films using a microwave discharge under a magnetic field of electron cyclotron resonance (ECR). The films fabricated in ECR plasma are predominantly Si-H bonded because of high-energy plasma particle bombardment. The films fabricated on glass substrates, however, peel off easily because of the difference in the coefficient of heat expansion between the film and the substrate. The films fabricated out of ECR plasma are not subjected to the bombardment and are mainly Si-H2 bonded. These films do not peel off even when deposited on glass substrate and are of high quality.

本文言語English
ページ(範囲)343-345
ページ数3
ジャーナルJapanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers
28
3
出版ステータスPublished - 1989 3月

ASJC Scopus subject areas

  • 物理学および天文学(その他)

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