Fabrication of carbon nanostructures using photo-nanoimprint lithography and pyrolysis

Varun Penmatsa, Hiroshi Kawarada, Chunlei Wang

研究成果: Article査読

31 被引用数 (Scopus)

抄録

High-throughput synthesis of carbon nanostructures with reproducible shape and dimensions, at desired locations, has been a key challenge for further exploring carbon nanostructures as functional units in various nanodevices. In this work, carbon structures with dimensions from the 50 nano- to micrometer level have been fabricated by carbonizing a photo-nanoimprint lithography patterned resist polymer (AR-UL-01) at high temperature under inert atmosphere. The resulting carbon nanostructures showed significant vertical shrinkage but minimal loss in the lateral direction. Thermal behavior studies of the resist polymer in the pyrolysis cycle indicated gaseous evolution of various byproducts before the formation of solid carbon. Microstructure, elemental composition and resistivity characterization of the nanostructures produced by this process has shown that the carbon derived from a pyrolyzed nanoimprint resist is very similar to the pyrolyzed photoresist carbon from an SU-8 negative-tone photoresist. This simple approach is valuable as a wafer-level carbon nano-patterning technique.

本文言語English
論文番号045024
ジャーナルJournal of Micromechanics and Microengineering
22
4
DOI
出版ステータスPublished - 2012 4 1

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Mechanics of Materials
  • Mechanical Engineering
  • Electrical and Electronic Engineering

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