Fabrication of CoPt magnetic nanodot arrays by electrodeposition process

Takanari Ouchi, Yuki Arikawa, Takayuki Homma

研究成果: Article査読

32 被引用数 (Scopus)

抄録

We attempted to fabricate patterned media using the electrochemical deposition process along with nanopatterned substrates prepared by the electron beam lithography (EBL), UV nanoimprint lithography (UV-NIL), and spin-on-glass nanoimprint lithography (SOG-NIL) approaches. CoPt was electrodeposited into the nanopatterned substrates and chemical mechanical polishing was carried out to planarize the surface. It was clarified that CoPt nanodot arrays were successfully deposited into the patterned nanopores fabricated by UV-NIL and SOG-NIL as well as by EBL with high area selectivity and uniformity. The density of the CoPt nanodot arrays deposited into the nanopores fabricated by EBL was equal up to an areal recording density of 250 Gbit/in2.

本文言語English
ページ(範囲)3104-3107
ページ数4
ジャーナルJournal of Magnetism and Magnetic Materials
320
22
DOI
出版ステータスPublished - 2008 11

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics

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