Fabrication of diamond films under high density helium plasma formed by electron cyclotron resonance

Motokazu Yuasa, Hiroshi Kawarada, Jin Wei, Jing Sheng Ma, Jun ichi Suzuki, Sigenobu Okada, Akio Hiraki

研究成果: Article査読

8 被引用数 (Scopus)

抄録

Helium gas has been employed instead of hydrogen as the carrier gas to fabricate diamond films using a magneto-active plasma chemical vapour deposition (CVD) system at low pressures. Helium plasma has a much higher plasma density than hydrogen plasma and it has been shown that this promotes fabrication of good quality diamond films at low pressures. Using a gas mixture of methyl alcohol and helium, microcrystalline diamond films with a grain size smaller than 500 Å have been fabricated. These microsized diamond films have been investigated by employing X-ray photoelectron spectroscopy, and features equivalent to those of natural diamond have been obtained.

本文言語English
ページ(範囲)374-380
ページ数7
ジャーナルSurface and Coatings Technology
49
1-3
DOI
出版ステータスPublished - 1991 12 10

ASJC Scopus subject areas

  • 化学 (全般)
  • 凝縮系物理学
  • 表面および界面
  • 表面、皮膜および薄膜
  • 材料化学

フィンガープリント

「Fabrication of diamond films under high density helium plasma formed by electron cyclotron resonance」の研究トピックを掘り下げます。これらがまとまってユニークなフィンガープリントを構成します。

引用スタイル