Fabrication of diamond films under high density helium plasma formed by electron cyclotron resonance

Motokazu Yuasa*, Hiroshi Kawarada, Jin Wei, Jing Sheng Ma, Jun ichi Suzuki, Sigenobu Okada, Akio Hiraki

*この研究の対応する著者

研究成果: Article査読

8 被引用数 (Scopus)

抄録

Helium gas has been employed instead of hydrogen as the carrier gas to fabricate diamond films using a magneto-active plasma chemical vapour deposition (CVD) system at low pressures. Helium plasma has a much higher plasma density than hydrogen plasma and it has been shown that this promotes fabrication of good quality diamond films at low pressures. Using a gas mixture of methyl alcohol and helium, microcrystalline diamond films with a grain size smaller than 500 Å have been fabricated. These microsized diamond films have been investigated by employing X-ray photoelectron spectroscopy, and features equivalent to those of natural diamond have been obtained.

本文言語English
ページ(範囲)374-380
ページ数7
ジャーナルSurface and Coatings Technology
49
1-3
DOI
出版ステータスPublished - 1991 12月 10

ASJC Scopus subject areas

  • 化学 (全般)
  • 凝縮系物理学
  • 表面および界面
  • 表面、皮膜および薄膜
  • 材料化学

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