Fabrication of Co-Pt and Fe-Pt ferromagnetic nanodot arrays for the application of ultra-high density bit patterned media (BPM) by electrochemical processes was described. In order to form patterned substrates for nanodot arrays with the density higher than 1 Tbit/inch<sup>2</sup>, electron beam lithography technique was employed. Nanopatterns with 25 nm and 18 nm pitch, which correspond to 1 and 2 Tbit/inch<sup>2</sup> were successfully formed by optimizing the condition of the lithography process, and Co-Pt and Fe-Pt with relatively high coercivity of 4.8 kOe and 10.3 kOe were formed by electrodeposition. By utilizing the nanopatterned substrates, Co-Pt and Fe-Pt nanodot arrays with 25 nm and 35 nm pitch were uniformly formed. These results demonstrate capability of the electrochemical processes for fabricating magnetic nanodot arrays with Tbit-level density.
|出版者||Electrochemical Society Inc.|
|出版物ステータス||Published - 2014|
|イベント||Symposium on Magnetic Materials, Processes, and Devices 13 - 2014 ECS and SMEQ Joint International Meeting - Cancun, Mexico|
継続期間: 2014 10 5 → 2014 10 9
|Other||Symposium on Magnetic Materials, Processes, and Devices 13 - 2014 ECS and SMEQ Joint International Meeting|
|期間||14/10/5 → 14/10/9|
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