Fabrication of heteroepitaxial diamond thin films on Ir(001)/MgO(001) substrates using antenna-edge-type microwave plasma-assisted chemical vapor deposition

Toyokatsu Fujisaki*, Minoru Tachiki, Norikazu Taniyama, Minoru Kudo, Hiroshi Kawarada

*この研究の対応する著者

研究成果: Article査読

10 被引用数 (Scopus)

抄録

Diamond heteroepitaxial thin films were successfully synthesized on high-quality Ir(001)/MgO(001) substrates. In bias-enhanced nucleation, antenna-edge-type microwave plasma-assisted chemical vapor deposition (MPCVD) was used. Subsequently, the <001> selective and smoothing growth processes were conducted by conventional MPCVD. Reconstructed (2×1) structure patterns have been observed by reflection high-energy electron diffraction (RHEED), which indicated that the surface of the diamond film is very smooth. The mean roughness is less than 2 nm in a 10-μm2 area, as revealed by atomic force microscopy observations.

本文言語English
ページ(範囲)478-481
ページ数4
ジャーナルDiamond and Related Materials
11
3-6
DOI
出版ステータスPublished - 2002 3

ASJC Scopus subject areas

  • 電子材料、光学材料、および磁性材料
  • 化学 (全般)
  • 機械工学
  • 材料化学
  • 電子工学および電気工学

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