Fabrication of layered polydimethylsiloxane/perfluoropolyether microfluidic devices with solvent compatibility and valve functionality

Marco Domenichini, Ranjana Sahai, Piero Castrataro, Roberto Valsecchi, Claudio Tonelli, Francesco Greco, Paolo Dario

研究成果: Article査読

7 被引用数 (Scopus)

抄録

The development of multilayer soft lithography methodology has seen polydimethysiloxane (PDMS) as the preferred material for the fabrication of microfluidic devices. However, the functionality of these PDMS microfluidic chips is often limited by the poor chemical resistance of PDMS to certain solvents. Here, we propose the use of a photocurable perfluoropolyether (PFPE), specifically FOMBLIN® MD40 PFPE, as a candidate material to provide a solvent-resistant buffer layer to make the device substantially impervious to chemically induced swelling. We first carried out a systematic study of the solvent resistance properties of FOMBLIN® MD40 PFPE as compared with PDMS. The comparison presented here demonstrates the superiority of FOMBLIN® MD40 PFPE over PDMS in this regard; moreover, the results permitted to categorize solvents in four different groups depending on their swelling ratio. We then present a step-by-step recipe for a novel fabrication process that uses multilayer lithography to construct a comprehensive solvent-resistant device with fluid and control channels integrated with a valve structure and also permitting easy establishment of outside connections.

本文言語English
ページ(範囲)753-762
ページ数10
ジャーナルMicrofluidics and Nanofluidics
15
6
DOI
出版ステータスPublished - 2013 12
外部発表はい

ASJC Scopus subject areas

  • 凝縮系物理学
  • 電子材料、光学材料、および磁性材料
  • 材料化学

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