Fabrication of low dislocation density GaN template by nano-channel FIELO communication using nanoimprint lithography

Akiko Okada, Shuichi Shoji, Hidetoshi Shinohara, Hiromi Nishihara, Hiroshi Goto, Haruo Sunakawa, Toshiharu Matsueda, Akira Usui, Atsushi A. Yamaguchi, Jun Mizuno

研究成果: Article

5 引用 (Scopus)
元の言語English
ページ(範囲)69-72
ページ数4
ジャーナルJournal of Photopolymer Science and Technology
26
発行部数1
DOI
出版物ステータスPublished - 2013

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Nanoimprint lithography
Dry etching
Light emitting diodes
Fabrication

ASJC Scopus subject areas

  • Materials Chemistry
  • Polymers and Plastics
  • Organic Chemistry

これを引用

Fabrication of low dislocation density GaN template by nano-channel FIELO communication using nanoimprint lithography. / Okada, Akiko; Shoji, Shuichi; Shinohara, Hidetoshi; Nishihara, Hiromi; Goto, Hiroshi; Sunakawa, Haruo; Matsueda, Toshiharu; Usui, Akira; Yamaguchi, Atsushi A.; Mizuno, Jun.

:: Journal of Photopolymer Science and Technology, 巻 26, 番号 1, 2013, p. 69-72.

研究成果: Article

Okada, Akiko ; Shoji, Shuichi ; Shinohara, Hidetoshi ; Nishihara, Hiromi ; Goto, Hiroshi ; Sunakawa, Haruo ; Matsueda, Toshiharu ; Usui, Akira ; Yamaguchi, Atsushi A. ; Mizuno, Jun. / Fabrication of low dislocation density GaN template by nano-channel FIELO communication using nanoimprint lithography. :: Journal of Photopolymer Science and Technology. 2013 ; 巻 26, 番号 1. pp. 69-72.
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author = "Akiko Okada and Shuichi Shoji and Hidetoshi Shinohara and Hiromi Nishihara and Hiroshi Goto and Haruo Sunakawa and Toshiharu Matsueda and Akira Usui and Yamaguchi, {Atsushi A.} and Jun Mizuno",
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AU - Goto, Hiroshi

AU - Sunakawa, Haruo

AU - Matsueda, Toshiharu

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AU - Yamaguchi, Atsushi A.

AU - Mizuno, Jun

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KW - Hydride vapor phase epitaxy

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