Fabrication of magnetic nanodots array using UV nanoimprint lithography and electrodeposition for high density patterned media

Hidetoshi Shinohara*, Makoto Fukuhara, Tamano Hirasawa, Jun Mizuno, Shuichi Shoji

*この研究の対応する著者

研究成果: Article査読

16 被引用数 (Scopus)

抄録

A Magnetic nanodots array fabrication method using ultraviolet nanoimprint lithography (UV-NIL) and electrodeposition was developed. Since the photocurable resin patterned by UV-NIL was directly used for electrodeposition mask, simple and high throughput fabrication process was realized. The CoPt nanodots (diameter: 120 nm) array was formed after the electrodeposition. After chemical mechanical polishing (CMP), the arithmetic mean roughness (Ra) of the track area was smaller than 1 nm.

本文言語English
ページ(範囲)591-596
ページ数6
ジャーナルJournal of Photopolymer Science and Technology
21
4
DOI
出版ステータスPublished - 2008

ASJC Scopus subject areas

  • ポリマーおよびプラスチック
  • 有機化学
  • 材料化学

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