Fabrication of metallic nanopatterns using the vacuum type UV-NIL equipment

Makoto Fukuhara*, Jun Mizuno, Mikiko Saito, Takayuki Homma, Shuichi Shoji

*この研究の対応する著者

研究成果: Article査読

15 被引用数 (Scopus)

抄録

Nanoscale dot patterns of cobalt alloy were formed on a silicon substrate using the ultra-violet nanoimprint lithography (UV-NIL) technology in combination with an electrodeposition process. We developed an improved UV-NIL equipment that can evacuate the chamber during imprinting. Using this equipment, we successfully imprinted 240-nm dot patterns with 500 nm pitch on a photocurable resin with high dimensional accuracy. Thickness control of the resin and imprinting under vacuum are important issues to obtain fine nanopatterns. Using these resin patterns as a mask layer, 300-nm cobalt alloy patterns are successfully formed by the electrodeposition process.

本文言語English
ページ(範囲)307-312
ページ数6
ジャーナルIEEJ Transactions on Electrical and Electronic Engineering
2
3
DOI
出版ステータスPublished - 2007 5月

ASJC Scopus subject areas

  • 電子工学および電気工学

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