Fabrication of nano/microstructures in SiO2 and TiO2 by swift ions

K. Awazu, M. Fujimaki, S. Ishii, K. Shima, K. Nomura, Yoshimichi Ohki

    研究成果: Conference contribution

    抄録

    The authors introduce work on 2D and 3D nano/microfabrication with MeV ion beam irradiation on a-SiO2 and rutile single crystal TiO2. The electronic stopping of the ions is responsible for the track formation. The latent tracks atomic structure and enhanced etch rate are identified.

    元の言語English
    ホスト出版物のタイトル2002 International Microprocesses and Nanotechnology Conference, MNC 2002
    出版者Institute of Electrical and Electronics Engineers Inc.
    ページ68-69
    ページ数2
    ISBN(印刷物)4891140313, 9784891140311
    DOI
    出版物ステータスPublished - 2002
    イベントInternational Microprocesses and Nanotechnology Conference, MNC 2002 - Tokyo, Japan
    継続期間: 2002 11 62002 11 8

    Other

    OtherInternational Microprocesses and Nanotechnology Conference, MNC 2002
    Japan
    Tokyo
    期間02/11/602/11/8

    Fingerprint

    Microfabrication
    Ion beams
    Irradiation
    Single crystals
    Fabrication
    Microstructure
    Ions

    ASJC Scopus subject areas

    • Hardware and Architecture
    • Electrical and Electronic Engineering

    これを引用

    Awazu, K., Fujimaki, M., Ishii, S., Shima, K., Nomura, K., & Ohki, Y. (2002). Fabrication of nano/microstructures in SiO2 and TiO2 by swift ions. : 2002 International Microprocesses and Nanotechnology Conference, MNC 2002 (pp. 68-69). [1178547] Institute of Electrical and Electronics Engineers Inc.. https://doi.org/10.1109/IMNC.2002.1178547

    Fabrication of nano/microstructures in SiO2 and TiO2 by swift ions. / Awazu, K.; Fujimaki, M.; Ishii, S.; Shima, K.; Nomura, K.; Ohki, Yoshimichi.

    2002 International Microprocesses and Nanotechnology Conference, MNC 2002. Institute of Electrical and Electronics Engineers Inc., 2002. p. 68-69 1178547.

    研究成果: Conference contribution

    Awazu, K, Fujimaki, M, Ishii, S, Shima, K, Nomura, K & Ohki, Y 2002, Fabrication of nano/microstructures in SiO2 and TiO2 by swift ions. : 2002 International Microprocesses and Nanotechnology Conference, MNC 2002., 1178547, Institute of Electrical and Electronics Engineers Inc., pp. 68-69, International Microprocesses and Nanotechnology Conference, MNC 2002, Tokyo, Japan, 02/11/6. https://doi.org/10.1109/IMNC.2002.1178547
    Awazu K, Fujimaki M, Ishii S, Shima K, Nomura K, Ohki Y. Fabrication of nano/microstructures in SiO2 and TiO2 by swift ions. : 2002 International Microprocesses and Nanotechnology Conference, MNC 2002. Institute of Electrical and Electronics Engineers Inc. 2002. p. 68-69. 1178547 https://doi.org/10.1109/IMNC.2002.1178547
    Awazu, K. ; Fujimaki, M. ; Ishii, S. ; Shima, K. ; Nomura, K. ; Ohki, Yoshimichi. / Fabrication of nano/microstructures in SiO2 and TiO2 by swift ions. 2002 International Microprocesses and Nanotechnology Conference, MNC 2002. Institute of Electrical and Electronics Engineers Inc., 2002. pp. 68-69
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    AU - Nomura, K.

    AU - Ohki, Yoshimichi

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