Fabrication of nanoscale gaps using a combination of self-assembled molecular and electron beam lithographic techniques

R. Negishi, T. Hasegawa, K. Terabe, M. Aono, T. Ebihara, H. Tanaka, T. Ogawa

研究成果: Article査読

61 被引用数 (Scopus)

抄録

We have developed and tested a new method of fabricating nanogaps using a combination of self-assembled molecular and electron beam lithographic techniques. The method enables us to control the gap size with an accuracy of approximately 2 nm and designate the positions where the nanogaps should be formed with high-resolution patterning by using electron beam lithography. We have demonstrated the utility of the fabricated nanogaps by measuring a single electron tunneling phenomenon through dodecanethiol-coated Au nanoparticles placed in the fabricated nanogap.

本文言語English
論文番号223111
ジャーナルApplied Physics Letters
88
22
DOI
出版ステータスPublished - 2006 5 29
外部発表はい

ASJC Scopus subject areas

  • Physics and Astronomy (miscellaneous)

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