Fabrication of nanosized structures on Nafion membranes by thermal nanoimprinting

Nobuya Hiroshiba, Wataru Yano, Ryuji Okumura, Yo Ichikawa

研究成果: Article

1 引用 (Scopus)

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We demonstrated a novel technique to fabricate nanosized structures on a Nafion membrane, using thermal nanoimprinting with a 5 × 5 μm2 square pattern Si mold without any polymer damage. A 24 MPa thermal imprinting pressure was used for 10 min. We observed high aspect ratio (∼1:10) pillars on the surface after imprinting at 200°C. Finally, we used a novel quartz mold with a 200 nm resolution dot pattern.

元の言語English
ページ(範囲)133-135
ページ数3
ジャーナルIEICE Transactions on Electronics
E98C
発行部数2
DOI
出版物ステータスPublished - 2015 2 1
外部発表Yes

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ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Electrical and Electronic Engineering

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