Fabrication of polymer and metal three-dimensional micromesh structures

Hironobu Sato, Yoshitaka Houshi, Toshiharu Otsuka, Shuichi Shoji

研究成果: Article査読

2 被引用数 (Scopus)

抄録

This paper presents the fabrication methods of polymer and metal three-dimensional (3-D) micromesh structures. The photoresist micromesh structures were formed using multiple inclined UV exposure from the backside of the SU-8 coated glass substrate with metal patterns. A few micrometer-size pillars and pores were realized by optimizing the UV lithography conditions. The 3-D macroporous-mesh Ni structures were also fabricated using electroplating. The inverse-mesh photoresist structures, fabricated by multiple inclined backside exposure, were used as molds for Ni electroplating. Ni meshes of about 3 μm in diameter were obtained by this method.

本文言語English
ページ(範囲)8341-8344
ページ数4
ジャーナルJapanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers
43
12
DOI
出版ステータスPublished - 2004 12 1

ASJC Scopus subject areas

  • 工学(全般)
  • 物理学および天文学(全般)

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