Fabrication of silicon mold for thermal nanoimprint lithography

J. Matsui*, H. Takahashi, N. Xie, J. Mizuno, K. Utaka

*この研究の対応する著者

研究成果

抄録

We fabricated a silicon mold for thermal Nanoimprint Lithography (NIL) with EB exposure and Deep-RIE. As a result, we obtained that including a grating whose pitch was 230nm with low roughness.

本文言語English
ホスト出版物のタイトル2008 Int. Nano-Optoelectronics Workshop, iNOW 2008 in Cooperation With Int. Global-COE Summer School (Photonics Integration-Core Electronics
ホスト出版物のサブタイトルPICE) and 31st Int. Symposium on Optical Communications
ページ267-268
ページ数2
DOI
出版ステータスPublished - 2008
イベント2008 International Nano-Optoelectronics Workshop, iNOW 2008 in Cooperation With International Global-COE Summer School (Photonics Integration-Core Electronics: PICE) and 31st International Symposium on Optical Communications - Tokyo, Lake Saiko, Shanon Village, Japan
継続期間: 2008 8 22008 8 15

出版物シリーズ

名前2008 Int. Nano-Optoelectronics Workshop, iNOW 2008 in Cooperation With Int. Global-COE Summer School (Photonics Integration-Core Electronics: PICE) and 31st Int. Symposium on Optical Communications

Conference

Conference2008 International Nano-Optoelectronics Workshop, iNOW 2008 in Cooperation With International Global-COE Summer School (Photonics Integration-Core Electronics: PICE) and 31st International Symposium on Optical Communications
国/地域Japan
CityTokyo, Lake Saiko, Shanon Village
Period08/8/208/8/15

ASJC Scopus subject areas

  • コンピュータ ネットワークおよび通信
  • 電子工学および電気工学

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