Fabrication of the 3-D SU-8 fine micromesh and electroplated Ni micromesh structures

Hironobu Sato*, Yoshitaka Houshi, Toshiharu Otsuka, Shuichi Shoji

*この研究の対応する著者

研究成果: Conference contribution

2 被引用数 (Scopus)

抄録

This paper presents fabrication of the 3-D SU-8 fine micromesh structure and electroplated Ni micromesh structure. The SU-8 mesh structures were formed using multiple inclined UV exposure from backside of the SU-8 coated glass substrate with metal patterns. A few μm size pillars and pores were realized by optimizing the UV lithography conditions. The 3-D micromesh Ni structures were also fabricated using electroplating. The inverse-mesh photoresist structures, fabricated by multiple inclined backside exposure, were used as molds for Ni electroplating. Ni meshes of about 3μm in diameter were obtained by this method.

本文言語English
ホスト出版物のタイトルDigest of Papers - Microprocesses and Nanotechnology 2004
ページ304-305
ページ数2
出版ステータスPublished - 2004 12月 1
イベント2004 International Microprocesses and Nanotechnology Conference - Osaka, Japan
継続期間: 2004 10月 262004 10月 29

出版物シリーズ

名前Digest of Papers - Microprocesses and Nanotechnology 2004

Conference

Conference2004 International Microprocesses and Nanotechnology Conference
国/地域Japan
CityOsaka
Period04/10/2604/10/29

ASJC Scopus subject areas

  • 工学(全般)

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