抄録
A fabrication method of uniform gratings on composite semiconductors using ultraviolet nanoimprint lithography (UV-NIL) is described. Since the grating pattern was batch transferred to the resin on substrates in this process, a high throughput fabrication process is expected. Both the dry etching process and the wet etching process can be performed for composite semiconductors patterning. The uniformity of the pattern height on a 3 inch GaAs substrate is better than the standard deviation of 2.6.
| 本文言語 | English |
|---|---|
| ページ（範囲） | 213-217 |
| ページ数 | 5 |
| ジャーナル | Journal of Photopolymer Science and Technology |
| 巻 | 22 |
| 号 | 2 |
| DOI | |
| 出版ステータス | Published - 2009 |
ASJC Scopus subject areas
- ポリマーおよびプラスチック
- 有機化学
- 材料化学