Fast etching phenomenon of plasma-silicon nitride films over substrate steps

Atsushi Hiraiwa, Kiichiro Mukai, Seiki Harada, Takeo Yoshimi, Satoru Itoh

研究成果: Article

元の言語	English
ページ（範囲）	19-24
ページ数	6
ジャーナル	Japanese Journal of Applied Physics
巻	18
発行部数	1
DOI	https://doi.org/10.1143/JJAP.18.191
出版物ステータス	Published - 1979
外部発表	Yes

これを引用

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title = "Fast etching phenomenon of plasma-silicon nitride films over substrate steps",

author = "Atsushi Hiraiwa and Kiichiro Mukai and Seiki Harada and Takeo Yoshimi and Satoru Itoh",

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AU - Mukai, Kiichiro

AU - Harada, Seiki

AU - Yoshimi, Takeo

AU - Itoh, Satoru

PY - 1979

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JO - Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes

JF - Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes

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