Fast etching phenomenon of plasma-silicon nitride films over substrate steps

Atsushi Hiraiwa, Kiichiro Mukai, Seiki Harada, Takeo Yoshimi, Satoru Itoh

研究成果: Article › 査読

本文言語	English
ページ（範囲）	19-24
ページ数	6
ジャーナル	Japanese Journal of Applied Physics
巻	18
号	1
DOI	https://doi.org/10.1143/JJAP.18.191
出版ステータス	Published - 1979
外部発表	はい

ASJC Scopus subject areas

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AU - Itoh, Satoru

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