Fast recovery of excitonic absorption bleaching in tunneling biquantum well structures

Atsushi Tackeuchi, Shunichi Muto, Tsuguo Inata, Toshio Fujii

研究成果: Article査読

28 被引用数 (Scopus)

抄録

This letter demonstrates the fast recovery from excitonic absorption bleaching in tunneling biquantum well structures. A tunneling biquantum well consists of a series of narrow and wide wells. Recovery time was reduced to 1 ps using 1.7-nm-thick tunneling barriers, three orders of magnitude shorter than the few nanoseconds recovery due to radiative recombination. This is the fastest tunneling process observed to date.

本文言語English
ページ(範囲)1670-1672
ページ数3
ジャーナルApplied Physics Letters
58
15
DOI
出版ステータスPublished - 1991
外部発表はい

ASJC Scopus subject areas

  • Physics and Astronomy (miscellaneous)

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