Films Consisting of Innumerable Tapered Nanopillars of Mesoporous Silica for Universal Antireflection Coatings

Hirokatsu Miyata*, Shin Kitamura, Masatoshi Watanabe, Masahiko Takahashi

*この研究の対応する著者

研究成果: Article査読

1 被引用数 (Scopus)

抄録

Films with a fine structure consisting of innumerable nanopillars of mesoporous silica (MPS) are formed by a reactive ion etching process with a fluorine-containing gas. Each nanopillar has a tapered shape with a uniform height, which effectively suppresses reflection by the formation of an ideal graded refractive index structure. The nanopillars are spontaneously formed under low-pressure conditions, wherein locally deposited Al-F compounds, originating from an alumina plate in the etching chamber, work as a fine etching mask. The high etching rate of the MPS film allows a very high aspect ratio of the nanopillars. The refractive index of the MPS nanopillars can be universally tuned by a controlled incorporation of TiO2 into the mesopores, which results in effective reduction of reflectance on a given substrate. The outstanding antireflection performance is experimentally demonstrated for glass substrates with a wide refractive index range. Don't bounce back! Films with a fine structure consisting of nanopillars of mesoporous silica (MPS) are formed by a reactive ion etching process with a fluorine-containing gas. These antireflection coatings enable fine-tuning of the refractive index (see figure).

本文言語English
ページ(範囲)1618-1623
ページ数6
ジャーナルChemistry - An Asian Journal
11
10
DOI
出版ステータスPublished - 2016 5月 20
外部発表はい

ASJC Scopus subject areas

  • 生化学
  • 有機化学

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