Flattening property of a surface due to optical assisted chemical near-field etching

Y. Ogasawara*

*この研究の対応する著者

研究成果査読

2 被引用数 (Scopus)

抄録

A mechanism of surface flattening is proposed based on our original mathematical model of surface development by introducing a protrusion-selective etching process which has been demonstrated by the optical near-field assisted chemical etching of glass substrate. We study various mechanisms of surface development due to etching processes depending on the local curvature of substrate and explain that the nature of optical near-field showing the stronger field-matter coupling and associated field enhancement near a sharper protrusion is essential for the flattening property.

本文言語English
ページ(範囲)1-3
ページ数3
ジャーナルApplied Physics B: Lasers and Optics
97
1
DOI
出版ステータスPublished - 2009 9

ASJC Scopus subject areas

  • 物理学および天文学(全般)
  • 物理学および天文学(その他)

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