抄録
A mechanism of surface flattening is proposed based on our original mathematical model of surface development by introducing a protrusion-selective etching process which has been demonstrated by the optical near-field assisted chemical etching of glass substrate. We study various mechanisms of surface development due to etching processes depending on the local curvature of substrate and explain that the nature of optical near-field showing the stronger field-matter coupling and associated field enhancement near a sharper protrusion is essential for the flattening property.
| 本文言語 | English |
|---|---|
| ページ（範囲） | 1-3 |
| ページ数 | 3 |
| ジャーナル | Applied Physics B: Lasers and Optics |
| 巻 | 97 |
| 号 | 1 |
| DOI | |
| 出版ステータス | Published - 2009 9月 |
ASJC Scopus subject areas
- 物理学および天文学（全般）
- 物理学および天文学（その他）