Flow orientation in langmuir-blodgett films of a charge-transfer complex (TMTTF)3(C14TCNQ)2

Keiichi Ikegami*, Shin Ichi Kuroda, Yuka Tabe, Kazuhiro Saito, Michio Sugi, Mutsuyoshi Matsumoto, Takayoshi Nakamura, Yasujiro Kawabata

*この研究の対応する著者

研究成果: Article査読

17 被引用数 (Scopus)

抄録

The occurrence of flow orientation during the deposition of Langmuir-Blodgett films of (TMTTF)3(C14TCNQ)2 is shown through studies of in-plane molecular orientation in films deposited by two types of the vertical dipping method, with the substrates parallel and perpendicular to the barrier, using ESR and polarized UV-visible spectroscopies. Larger in-plane anisotropy is observed toward the edge of the substrates, which is consistent with the prediction of the recent theory of flow orientation during the deposition process. Furthermore, in-plane anisotropy in the films deposited by the horizontal lifting method is detected, suggesting the existence of a compression orientation at the air-water interface.

本文言語English
ページ(範囲)1206-1212
ページ数7
ジャーナルJapanese journal of applied physics
31
4 R
DOI
出版ステータスPublished - 1992 4月
外部発表はい

ASJC Scopus subject areas

  • 工学(全般)
  • 物理学および天文学(全般)

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