Formation of micro and nanoscale patterns of monolayer templates for position selective immobilization of oligonucleotide using ultraviolet and electron beam lithography

Daisuke Niwa, Kaoru Omichi, Norikazu Motohashi, Takayuki Homma, Tetsuya Osaka

研究成果: Article査読

13 被引用数 (Scopus)

抄録

Formation of organosilane monolayer templates using ultraviolet and electron-beam (EB) lithography was investigated. The oligonucleotides were covalently immobilized with high selectivity only to the amino-monolayer modified regions locally formed on the template surfaces at micro and nanometer scale. By using EB lithography, patterned immobilization in nanometer scale, as small as 20 nm, was achieved.

本文言語English
ページ(範囲)176-177
ページ数2
ジャーナルChemistry Letters
33
2
DOI
出版ステータスPublished - 2004 2 5

ASJC Scopus subject areas

  • Chemistry(all)

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