Formation of uniaxially (1 1 2̄ 0) textured ZnO films on glass substrates

Takahiko Yanagitani, Mami Matsukawa, Yoshiaki Watanabe, Takahiko Otani

研究成果: Article査読

27 被引用数 (Scopus)

抄録

Making use of the RF magnetron sputtering technique, we have succeeded in fabricating ZnO films where c-axis of crystallites are unidirectionally aligned in the plane, without the mechanism of epitaxy. The alignment of c-axis in the plane was then carefully investigated by the X-ray pole figure analysis and atomic force microscope measurements. From these results, we have revealed the effect of substrate position during sputtering on the c-axis alignment in the plane. We have also pointed out the important effect of the oxygen ions in the RF plasma on the (1 1 2̄ 0) texture formation.

本文言語English
ページ(範囲)424-430
ページ数7
ジャーナルJournal of Crystal Growth
276
3-4
DOI
出版ステータスPublished - 2005 4 1
外部発表はい

ASJC Scopus subject areas

  • Condensed Matter Physics
  • Inorganic Chemistry
  • Materials Chemistry

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