Frequency-resolved high-harmonic wavefront characterization

E. Frumker, G. G. Paulus, H. Niikura, D. M. Villeneuve, P. B. Corkum

研究成果: Article査読

40 被引用数 (Scopus)

抄録

We introduce and demonstrate a novel concept of frequency-resolved wavefront characterization. Our ap proach is particularly suitable for high-harmonic, extreme-UV (XUV) and soft X-ray radiation. The concept is based on an analysis of radiation diffracted from a slit scanned in front of a flat-field XUV spectrometer. With the spectrally resolved signal spread across one axis and the spatially resolved diffraction pattern in the other dimension, we reconstruct the wavefront. While demonstrated for high harmonics, the method is not restricted in wavelength.

本文言語English
ページ(範囲)3026-3028
ページ数3
ジャーナルOptics Letters
34
19
DOI
出版ステータスPublished - 2009 10 1
外部発表はい

ASJC Scopus subject areas

  • 原子分子物理学および光学

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