Glassy Distribution of Bi3+/Bi5+ in Bi1-xPbxNiO3 and Negative Thermal Expansion Induced by Intermetallic Charge Transfer

Kiho Nakano, Kengo Oka, Tetsu Watanuki, Masaichiro Mizumaki, Akihiko Machida, Akane Agui, Hyunjeong Kim, Jun Komiyama, Takashi Mizokawa, Takumi Nishikubo, Yuichiro Hattori, Shigenori Ueda, Yuki Sakai*, Masaki Azuma

*この研究の対応する著者

研究成果: Article査読

18 被引用数 (Scopus)

抄録

The valence distribution and local structure of Bi1-xPbxNiO3 (x ≤ 0.25) were investigated by comprehensive studies of Rietveld analysis of synchrotron X-ray diffraction (SXRD) data, X-ray absorption spectroscopy (XAS), hard X-ray photoemission spectroscopy (HAXPES), and pair distribution function (PDF) analysis of synchrotron X-ray total scattering data. Disproportionation of Bi ions into Bi3+ and Bi5+ was observed for all the samples, but it was a long-ranged one with distinct crystallographic sites in the P1 triclinic structure for x ≤ 0.15, while the ordering was short-ranged for x = 0.20 and 0.25. An intermetallic charge transfer between Bi5+ and Ni2+, leading to large volume shrinkage, was observed for all the samples upon heating at ∼500 K.

本文言語English
ページ(範囲)6062-6067
ページ数6
ジャーナルChemistry of Materials
28
17
DOI
出版ステータスPublished - 2016 9 13

ASJC Scopus subject areas

  • 化学 (全般)
  • 化学工学(全般)
  • 材料化学

フィンガープリント

「Glassy Distribution of Bi<sup>3+</sup>/Bi<sup>5+</sup> in Bi<sub>1-x</sub>Pb<sub>x</sub>NiO<sub>3</sub> and Negative Thermal Expansion Induced by Intermetallic Charge Transfer」の研究トピックを掘り下げます。これらがまとまってユニークなフィンガープリントを構成します。

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