Graphene layer formation on polycrystalline nickel grown by chemical vapor deposition

Kenichi Kanzaki*, Hiroki Hibino, Toshiki Makimoto

*この研究の対応する著者

研究成果: Article査読

11 被引用数 (Scopus)

抄録

We studied the structure of graphene layers grown by chemical vapor deposition on polycrystalline nickel. The conditions of the polycrystalline nickel catalyst (size of fine crystals and surface roughness) were controlled by cyclic heating and cooling, and its effect on the graphene layer formation was evaluated. By increasing the average size of the nickel fine crystals and thereby increasing of the surface roughness, nonuniformity of the graphene sheet numbers tends to increase. A marked change in graphene sheet number tends to occur at discontinuities in the polycrystalline nickel surfaces. From the structural analysis, the graphene layer is found to be made up of single or multiple crystal graphene thin films with different crystallographic directions. The size of each thin film is independent of and not restricted by the size of the nickel fine crystals, and a certain thin film passes over the discontinuities.

本文言語English
論文番号035103
ジャーナルJapanese journal of applied physics
52
3 PART 1
DOI
出版ステータスPublished - 2013 3月 1
外部発表はい

ASJC Scopus subject areas

  • 工学(全般)
  • 物理学および天文学(全般)

フィンガープリント

「Graphene layer formation on polycrystalline nickel grown by chemical vapor deposition」の研究トピックを掘り下げます。これらがまとまってユニークなフィンガープリントを構成します。

引用スタイル