Growth and electro-optical characterization of ZnMgTe/ZnTe waveguide by molecular beam epitaxy

W. Sun*, T. Nakasu, K. Taguri, T. Aiba, S. Yamashita, M. Kobayashi, H. Togo, T. Asahi

*この研究の対応する著者

研究成果: Article査読

11 被引用数 (Scopus)

抄録

ZnMgTe/ZnTe/ZnMgTe thin film waveguide with high crystal quality were grown by molecular beam epitaxy (MBE). The in-plane mismatch between the ZnMgTe cladding layers and ZnTe core layer was about 0.02% which was measured by X-ray reciprocal space mapping (RSM). It indicated that films were grown coherently with high crystal quality. The Electro-Optical characterization of waveguide was evaluated using 1.55μm polarized lights and bias applied on the waveguide device from -15 V to +15 V. The de-pendence of light phase shift passed though the waveguide on the applied voltage bias was studied. The electro-optical characterization of the waveguide device was about 7% of the theoretical calculation. It could be improved by increasing the resistance ratio between the ZnMgTe/ZnTe/ZnMgTe waveguide structure and substrate so that the electric field applied on the waveguide structure could be improved. It was indicated that the ZnMgTe/ZnTe/ZnMgTe thin film waveguide has the potential to become a high efficiency electro-optical device.

本文言語English
ページ(範囲)1252-1255
ページ数4
ジャーナルPhysica Status Solidi (C) Current Topics in Solid State Physics
11
7-8
DOI
出版ステータスPublished - 2014 7

ASJC Scopus subject areas

  • 凝縮系物理学

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