Growth mechanism of PTO on MgO at initial stage

K. Nishida; K. Shirakata; M. Osada; M. Kakihana; T. Katoda

doi:10.1016/S0169-4332(03)00455-0

Growth mechanism of PTO on MgO at initial stage

K. Nishida^*, K. Shirakata, M. Osada, M. Kakihana, T. Katoda

^*この研究の対応する著者

研究成果: Article › 査読

4 被引用数 (Scopus)

抄録

Growth mechanism of a lead titanate (PbTiO₃, PTO) thin film at the initial stage has been made clear. The mechanism is strongly affected by accumulation and release of stress. Flatness of the surface and the crystallographic orientation of the PTO film change with growth mode.

本文言語	English
ページ（範囲）	323-328
ページ数	6
ジャーナル	Applied Surface Science
巻	216
号	1-4 SPEC.
DOI	https://doi.org/10.1016/S0169-4332(03)00455-0
出版ステータス	Published - 2003 6月 30
外部発表	はい

ASJC Scopus subject areas

物理化学および理論化学
表面、皮膜および薄膜
凝縮系物理学

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10.1016/S0169-4332(03)00455-0

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title = "Growth mechanism of PTO on MgO at initial stage",

abstract = "Growth mechanism of a lead titanate (PbTiO3, PTO) thin film at the initial stage has been made clear. The mechanism is strongly affected by accumulation and release of stress. Flatness of the surface and the crystallographic orientation of the PTO film change with growth mode.",

keywords = "Film orientation, Growth mechanism, PTO, Residual stress, Surface roughness",

author = "K. Nishida and K. Shirakata and M. Osada and M. Kakihana and T. Katoda",

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AU - Nishida, K.

AU - Shirakata, K.

AU - Osada, M.

AU - Kakihana, M.

AU - Katoda, T.

PY - 2003/6/30

Y1 - 2003/6/30

N2 - Growth mechanism of a lead titanate (PbTiO3, PTO) thin film at the initial stage has been made clear. The mechanism is strongly affected by accumulation and release of stress. Flatness of the surface and the crystallographic orientation of the PTO film change with growth mode.

AB - Growth mechanism of a lead titanate (PbTiO3, PTO) thin film at the initial stage has been made clear. The mechanism is strongly affected by accumulation and release of stress. Flatness of the surface and the crystallographic orientation of the PTO film change with growth mode.

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KW - Growth mechanism

KW - PTO

KW - Residual stress

KW - Surface roughness

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Growth mechanism of PTO on MgO at initial stage

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