Growth of dense single-walled carbon nanotubes in nano-sized silicon dioxide holes for future microelectronics

T. Iwasaki, R. Morikane, T. Edura, M. Tokuda, K. Tsutsui, Y. Wada, Hiroshi Kawarada

    研究成果: Article

    15 引用 (Scopus)

    抄録

    Dense and aligned single-walled carbon nanotubes (SWCNTs) were synthesised in nano-sized silicon dioxide holes patterned using electron beam lithography for microelectronics applications. Carbon nanotubes are new materials with potential uses for interconnects and field effect transistors (FETs) of LSI. As single-walled carbon nanotubes have lower resistance than multi-walled carbon nanotubes in close-packed arrangements and show both metallic and semiconducting behaviour, there is a great deal of interest in using dense SWCNTs for low resistive interconnects and high current transistors. Here, we report not only a method for fabrication of SWCNTs in nano-sized holes, but also differences in growth rate and Raman spectroscopy of CNTs in holes of various sizes. The growth rate of CNTs in the holes decreased as the hole size was reduced, due to the amount of carbon radicals diffusing to the catalyst particles at the bottom of the holes.

    元の言語English
    ページ(範囲)2351-2355
    ページ数5
    ジャーナルCarbon
    45
    発行部数12
    DOI
    出版物ステータスPublished - 2007 10

    Fingerprint

    Single-walled carbon nanotubes (SWCN)
    Microelectronics
    Silicon Dioxide
    Silica
    Carbon Nanotubes
    Carbon nanotubes
    Electron beam lithography
    Field effect transistors
    Raman spectroscopy
    Transistors
    Carbon
    Fabrication
    Catalysts

    ASJC Scopus subject areas

    • Materials Chemistry

    これを引用

    Growth of dense single-walled carbon nanotubes in nano-sized silicon dioxide holes for future microelectronics. / Iwasaki, T.; Morikane, R.; Edura, T.; Tokuda, M.; Tsutsui, K.; Wada, Y.; Kawarada, Hiroshi.

    :: Carbon, 巻 45, 番号 12, 10.2007, p. 2351-2355.

    研究成果: Article

    Iwasaki, T. ; Morikane, R. ; Edura, T. ; Tokuda, M. ; Tsutsui, K. ; Wada, Y. ; Kawarada, Hiroshi. / Growth of dense single-walled carbon nanotubes in nano-sized silicon dioxide holes for future microelectronics. :: Carbon. 2007 ; 巻 45, 番号 12. pp. 2351-2355.
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    abstract = "Dense and aligned single-walled carbon nanotubes (SWCNTs) were synthesised in nano-sized silicon dioxide holes patterned using electron beam lithography for microelectronics applications. Carbon nanotubes are new materials with potential uses for interconnects and field effect transistors (FETs) of LSI. As single-walled carbon nanotubes have lower resistance than multi-walled carbon nanotubes in close-packed arrangements and show both metallic and semiconducting behaviour, there is a great deal of interest in using dense SWCNTs for low resistive interconnects and high current transistors. Here, we report not only a method for fabrication of SWCNTs in nano-sized holes, but also differences in growth rate and Raman spectroscopy of CNTs in holes of various sizes. The growth rate of CNTs in the holes decreased as the hole size was reduced, due to the amount of carbon radicals diffusing to the catalyst particles at the bottom of the holes.",
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    AU - Iwasaki, T.

    AU - Morikane, R.

    AU - Edura, T.

    AU - Tokuda, M.

    AU - Tsutsui, K.

    AU - Wada, Y.

    AU - Kawarada, Hiroshi

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    N2 - Dense and aligned single-walled carbon nanotubes (SWCNTs) were synthesised in nano-sized silicon dioxide holes patterned using electron beam lithography for microelectronics applications. Carbon nanotubes are new materials with potential uses for interconnects and field effect transistors (FETs) of LSI. As single-walled carbon nanotubes have lower resistance than multi-walled carbon nanotubes in close-packed arrangements and show both metallic and semiconducting behaviour, there is a great deal of interest in using dense SWCNTs for low resistive interconnects and high current transistors. Here, we report not only a method for fabrication of SWCNTs in nano-sized holes, but also differences in growth rate and Raman spectroscopy of CNTs in holes of various sizes. The growth rate of CNTs in the holes decreased as the hole size was reduced, due to the amount of carbon radicals diffusing to the catalyst particles at the bottom of the holes.

    AB - Dense and aligned single-walled carbon nanotubes (SWCNTs) were synthesised in nano-sized silicon dioxide holes patterned using electron beam lithography for microelectronics applications. Carbon nanotubes are new materials with potential uses for interconnects and field effect transistors (FETs) of LSI. As single-walled carbon nanotubes have lower resistance than multi-walled carbon nanotubes in close-packed arrangements and show both metallic and semiconducting behaviour, there is a great deal of interest in using dense SWCNTs for low resistive interconnects and high current transistors. Here, we report not only a method for fabrication of SWCNTs in nano-sized holes, but also differences in growth rate and Raman spectroscopy of CNTs in holes of various sizes. The growth rate of CNTs in the holes decreased as the hole size was reduced, due to the amount of carbon radicals diffusing to the catalyst particles at the bottom of the holes.

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