Growth of Ge 1-xC x alloys on Si by combined low-energy ion beam and molecular beam epitaxy method

H. Shibata*, S. Kimura, P. Fons, A. Yamada, Y. Makita, A. Obara, Naoto Kobayashi, H. Takahashi, H. Katsumata, J. Tanabe, S. Uekusa

*この研究の対応する著者

研究成果: Conference contribution

抄録

A combined ion beam and molecular beam epitaxy (CIBMBE) method was applied for the deposition of a Ge 1-xC x alloy on Si(100) using a low-energy (50-100 eV) C + ion beam and a Ge molecular beam. Metastable Ge 1-xC x solid solutions were formed up to x = 0.047, and the CIBMBE method was shown to have a very high potential to grow metastable Ge 1-xC x alloys. It was also revealed that the sticking coefficient of C + ions into Ge was approximately 28% for E i = 100 eV and approximately 18% for E i = 50 eV. Structural characterization suggests that the deposited films are single crystals grown epitaxially on the substrate with twins on {111} planes. Characterization of lattice dynamics using Raman spectroscopy suggested that the deposited layers have a small amount of ion irradiation damage.

本文言語English
ホスト出版物のタイトルMaterials Research Society Symposium - Proceedings
編集者I.M. Robertson, G.S. Was, L.W. Hobbs, T.D. de la Rubia
出版社Materials Research Society
ページ233-238
ページ数6
439
出版ステータスPublished - 1997
外部発表はい
イベントProceedings of the 1996 MRS Fall Symposium - Boston, MA, USA
継続期間: 1996 12月 21996 12月 5

Other

OtherProceedings of the 1996 MRS Fall Symposium
CityBoston, MA, USA
Period96/12/296/12/5

ASJC Scopus subject areas

  • 電子材料、光学材料、および磁性材料

フィンガープリント

「Growth of Ge 1-xC x alloys on Si by combined low-energy ion beam and molecular beam epitaxy method」の研究トピックを掘り下げます。これらがまとまってユニークなフィンガープリントを構成します。

引用スタイル